Mach-Zehnder 干涉器可應用在通訊以及生物醫學上，在通訊方面可以運用在波長濾波器進行分工多波器之設計，然而分工多波器對製程相當敏感，因此利用Z轉換可達到對製程上之不敏感，若此分工多波器三級之結構，考慮第二級之延遲項放置上端或是下端，並且加入相位移可以發現三級且延遲項放置下端效果較好，因此利用此方法進行分工多波器之設計。在醫學生物應用上可以利用Mach-Zehnder 干涉進行表面電漿生物感測器，其工作原理在波導上面與側面上覆蓋一層金屬，當光傳遞到金屬時，將會在矽波導與金屬交接面產生一表面電漿波以及金屬與介質待測物交接面產生另一表面電漿波，當此兩表面電漿波至金屬層尾端時，再回傳至矽波導層，此種機制等同於Mach-Zehnder干涉器。
在進行表面電漿生物感測器的製程可以分成三個部分，第一部分是黃光，第二部分是蝕刻，第三部分是化學氣相沉積以及金屬的物理沉積的部分。而表面電漿生物感測器會有三道光罩，依序為定義波導層、金屬感測區開窗、非金屬感測區開窗。第一道光罩會用到的製程有三個分別是黃光、蝕刻以及化學氣相沉積，而此步驟最為重要是因為如果波導尺寸不對，就無法將TM模侷限在波導裡傳輸，因此進行此步驟需要嚴格的黃光線寬要求以及精準的蝕刻深度方可達到波導尺寸。第二道是金屬感測區開窗，我們須先在完成第一道的波導層之後進行化學氣相沉積二氧化矽，才可進行第二道的金屬感測區之動作，此光罩需要用到的製程有三個分別為黃光、蝕刻以及金屬的物理氣相沉積，在此步驟黃光的線寬就可以不需要像第一道這麼嚴格要求，但是在蝕刻以及金屬沉積之部分需要嚴格控管深度以及波導三面金屬之厚度，以避免光損耗提升以及達到生物感測器之干涉效應。最後為第三道光罩之非感測區的開窗動作，而此動作會有兩個製程分別是黃光以及蝕刻，在此的兩個製程均不需要太嚴格的線寬要求以及蝕刻要求。

Mach-Zehnder interferometry (MZI) can be applied onto communication and biomedical science. In communication, the MZI based wavelength division multiplexing (WDM) wavelength filter is sensitive to the processing variation and can be improved by the Z-transform. Among the three stages of the WDM filter, the delay length on the second stage, put on the opposite side compared with the previous stage besides the phase adding, demonstrates the stable and outstanding optical performance.
In biomedical science, MZI was utilized to illustrate the surface plasmon resonance biosensing through the surrounding metal on silicon-wire waveguide. When the TM wave is injected into the plasmon region, there are two surface plasmon waves on the two metal layer surfaces will be generated and interfered as the interferograms. This mechanism is equivalent to a Mach-Zehnder interferometer.

The surface plasmon biosensor processing can be separated as three parts, lithography, etching, and deposition of chemical vapor and physical vapor, which photomask are carried by the waveguide layer, metal window and transition region between silicon-wire and plasmon. The first photomask is process related lithorgraphy and the precise waveguide size and etch depth are crucial to the optical performance. The second photomask is the sensing related open window and the deposition will be utilized for the growth of silicon dioxide and metal. The metal thickness control is very critical to the biosensing performance. Finally the third photomask will only be used to open the transition region between the silicon-wire and plasmon.

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