研究生: |
江景昇 Jing-Sheng Chiang |
---|---|
論文名稱: |
黃銅於原子力顯微鏡接觸式量測模式造成之應力腐蝕 The stress corrosion of brass by contact model atomic force microscopy |
指導教授: |
王朝正
Chaur-Jeng Wang |
口試委員: |
李志偉
Jyh-Wei Lee 鄭偉鈞 Wei-Chun Cheng |
學位類別: |
碩士 Master |
系所名稱: |
工程學院 - 機械工程系 Department of Mechanical Engineering |
論文出版年: | 2006 |
畢業學年度: | 94 |
語文別: | 中文 |
論文頁數: | 97 |
中文關鍵詞: | 氧化亞銅 、孔蝕 、黃銅 、原子力顯微鏡 、腐蝕 |
外文關鍵詞: | corrosion pits, cuprous oxide, Atomic force microscopy, brass, corrosion |
相關次數: | 點閱:258 下載:3 |
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本研究以原子力顯微鏡(AFM)於水溶液環境即時觀察黃銅合金於0.1 wt% 氯化銅水溶液中的腐蝕現象。結合場發射電子微探儀,觀察分析黃銅試片表面於腐蝕時所生成的蝕孔及氧化物,並利用X光繞射儀分析試片表面之腐蝕生成物成分。研究發現,原子力顯微鏡可以即時觀察銅合金於腐蝕溶液中產生奈米等級蝕孔與腐蝕生成物的過程,可用來研究黃銅於氯化銅水溶液受AFM探針影響誘發產生應力腐蝕。當C26000商用黃銅合金於0.1 wt% 氯化銅水溶液中時,試片表面會被侵蝕,因而產生蝕孔,表面生成顆粒狀的Cu2O,其顆粒尺寸與試片表面平均粗糙度(Ra)均隨著腐蝕浸泡時間增加而變大。當AFM探針的作用力施加在試片表面掃描時,探針掃描作用力會誘發應力腐蝕。
The atomic force microscopy (AFM) has been employed to investigate the in-situ corrosion phenomena of the brass immersed in 0.1 wt% CuCl2 aqueous solution. A field emission EPMA is also used to analyze the corrosion pits and corrosion products of brass. The crystalline phases of the corrosion products were examined by an X-ray diffractometer. It is found that the in-situ formation phenomena of corrosion pits and corrosion products on nano scale can be explored by the liquid mode AFM. The initial of stress corrosion reaction and corrosion kinetics of brass induced by the AFM tip in 0.1wt% CuCl2 aqueous solution are also investigated. It is found that the surface of commercial C26000 brass was attacked by the 0.1 wt% cuprous chloride aqueous solution observed by an in-situ AFM. Corrosion pits and Cu2O oxide particle are found on the alloy surface. The particle size and average surface roughness of the specimen increase with immersion time. The stress induced corrosion phenomena is observed when the AFM tip scans on the specimen surface.
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