本論文的研究目的，為利用電漿診斷技術探討調整電漿參數對常壓電漿物理性質之影響，所探討的物理性質包含電子溫度 (electron temperature, Te)、電子密度 (electron density, ne)、氣體流動行為以及放電行為。本研究利用非侵入式的量測方法，包括電壓電流波形量測 (waveform measurement)、紋影法 (shlieren)、光發射光譜 (optical emission spectroscopy, OES)、湯姆森散射 (Thomson scattering) 、以及雷射誘導螢光法 (Laser-induced Fluorescence, LIF)，探討改變氣體流率及施加電壓對電漿性質與電漿射流之影響。
本論文將分別設計不同的非侵入式檢測系統，探討兩種不同常壓電漿的物理性質。第一種常壓電漿系統為120 Hz 之交流電常壓電漿、第二種為微波常壓電漿。第一部份利用120 Hz 交流電常壓電漿的實驗結果顯示，當固定氣體流率為2 slm且施加電壓由5 kV增加至12 kV時，電漿的放電形式並無太大差異。利用波形量測結果發現，當流率由5 slm 增加至8 slm時，高電壓及電流響應於一周期時電漿放電次數分別為3次與7次，推測為當流率上升時，兩電極間的電阻增加、導致能量消耗，因此形成不均勻放電及再激發過程。另外，紋影分析的實驗結果顯示，氣體流率為2 slm時，當電漿成功形成時，氣體流動方式由層流變為擾流；而當氣體流率增加至5 slm時，且當施加電壓由5 kV上升至12 kV時，其層流區長度由6.5 mm縮減至1.5 mm。其原因為當施加能量使氣體游離時，該區域範圍之粒子密度增加、並與周遭氣體形成擾動。當氣體游離時，將使得氣體流速產生變化，而當兩不同流速的流體接觸時，將形成擾動。除此之外，光發射光譜量測結果，可發現於氣體流率為2 slm、且施加電壓上升至12 kV時，氣體迴轉溫度 (rotational temperature, Tr)上升至1550 ± 50 K，且當氣體流率上升至8 slm時，溫度下降為1180 ± 20 K。由於改變氣體流率比改變電壓於電漿性質之影響更為顯著，因此將探討羥自由基 (OH) 於不同氣體流率下隨電漿長度的濃度變化情形。研究結果顯示，羥自由基最大生成濃度的位置約位於層流轉為擾流的位置，推測羥自由基的生成是利用空氣中之氧化合物，例如氧氣、水分、碳氧化物等，因此當空氣藉由擾流進入電漿時，羥自由基的濃度為最高。
第二部分的實驗是利用湯姆森散射技術，量測微波常壓電漿束 (microwave atmospheric pressure plasma, MWAPPJ) 的物理性質，並藉由紋影分析探討流動行為對物理性質之影響。結果顯示，當氣體流率由2 slm增加至6 slm時，計算得到的電子密度由4.09 ± 2.01 × 1015 cm-3下降至2.13 ± 0.41 × 1015 cm-3、且電子溫度由1.28 ± 0.41上升至2.33 ± 0.72 eV。進一步將氣體流率增加至8 slm，電子溫度下降至1.99 ± 0.56 eV、但電子密度上升至3.90 ± 2.27 × 1015 cm-3。此現象藉由紋影分析結果解釋為，電漿的工作氣體與周圍氣體的擾動，導致電漿能量散失，此能量散失使其他分子發生游離與再結合反應，因此導致物理性質變化。除此之外，電漿束隨流率增加而縮短，且量測點位於電漿束末端，因此電子由電漿束崩離時，將伴隨強烈電場及動能導致溫度上升。

Plasma diagnostics played important roles in providing the flux of reactive species, the composition of plasmas, and the status of plasma processes. In this regard, the analytical methods were widely utilized to investigate the effects of operational parameters of the properties of atmospheric pressure plasma (APP) including temperature, density, discharge, and flow behaviors. In this thesis, the non-invasive diagnostic techniques including power waveform measurement, Schlieren analysis, optical emission spectroscopy (OES), laser scattering, and laser-induced fluorescence (LIF) were used to determine the type of discharges, flow behavior, rotational temperature (Tr), electron density (ne), electron temperature (Te), and the generation of hydroxyl radical (OH), respectively, as the functions of gas flow rates and applied voltages.
For the first plasma system, the 120 Hz AC atmospheric pressure plasma (120-Hz-AC-APP) was used to demonstrate the effects of gas flow rates and applied voltages on the discharge properties. The results indicated that the increase of gas flow rate caused the formation of spark discharge, due to the 3 spikes of high voltage response that were obtained when flow rate increased from 2 slm to 5 slm. This may be due to the increase of gas flow rates that resulted in the increase of the resistance between two electrodes and further perturbed the discharge. Additionally, the increase of gas flow rates and applied voltages resulted in the shortening of the laminar flow region, due to the turbulence behavior that took place by the Rayleigh-Taylor instability and Kelvin-Helmholtz instability. On the other hand, Tr increased from 1400 K to 1550 K by increasing the applied voltage from 5 kV to 12 kV at 2 slm discharge. Moreover, Tr increased from 950 K to 1180 K by increasing gas flow rate to 8 slm. Interestingly, the maximum concentration of OH was obtained at the position where the laminar flow turned into turbulence, due to the air species started to be dissociated by plasma and resulted in the recombination of reactive species.
In the second part of the thesis, the microwave APP jet (MWAPPJ) were employed to determine the influences of gas flow rates on the physical properties by Thomson scattering techniques. The variations of the physical properties were investigated by performing the Schlieren analyses. The results demonstrated that the increase of gas flow rate from 2 to 6 slm led the increase of Te from 1.28 ± 0.41 to 2.33 ± 0. 72 eV and the decrease of ne from 4.09 ± 2.01 × 1015 cm-3 to 2.13 ± 0.41 × 1015 cm-3. Furthermore, by increasing the gas flow rate to 8 slm, it was found that Te decreased to 1.99 ± 0.56 eV and the ne increased to 3.09 ± 2.27 × 1015 cm-3. The reason may be owing to the acquisition position is closed to the end of the plasma jet, in which the electrons avalanched to maintain the discharge and thus resulted in the high electron field and momentum.

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