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研究生: 洪聖栢
Sheng-Bo Hung
論文名稱: VNbMoTaW耐火高熵合金薄膜之機械性質與高溫氧化性質評估
Mechanical property and thermal evaluation of V-Nb-Mo-Ta-W high entropy alloy thin films
指導教授: 王朝正
Chaur-Jeng Wang
口試委員: 李志偉
Jyh-Wei Lee
陳士勛
Shih-Hsun Chen
學位類別: 碩士
Master
系所名稱: 工程學院 - 機械工程系
Department of Mechanical Engineering
論文出版年: 2019
畢業學年度: 107
語文別: 中文
論文頁數: 104
中文關鍵詞: VNbMoTaWAlVNbMoTaWCrB高熵合金薄膜薄膜硬度高溫氧化
外文關鍵詞: VNbMoTaWAl, VNbMoTaWCrB, high entropy alloys, hardness, high temperature oxidation
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  • 本研究以VNbMoTaW高熵合金靶材分別跟Al靶材和CrB2合金靶材進行共濺鍍,並將薄膜進行300、500、800 度一小時高溫氧化測試,探討鋁或鉻、硼元素增加對VNbMoTaW高熵合金薄膜的影響。由結果可以看出,當鋁濃度由10.7 at. %增加至29.7 at. %,薄膜硬度由10.9 GPa下降至7.2 GPa,而薄膜於500度一小時氧化測試後之氧化層,則從280 nm降低至195 nm;當鉻和硼濃度增加時,高熵合金薄膜從BCC結構變為非晶結構,薄膜的橫截面微觀形貌也從柱狀結構變為無特徵結構,當CrB2合金靶材功率在300 W時,薄膜有最大硬度18.4 GPa,而500度一小時氧化測試後之氧化層,則從524 nm降低至33 nm。故於VNbMoTaW高熵合金添加鋁或鉻、硼元素,能提升VNbMoTaW高熵合金薄膜於500度之抗氧化能力。


    High entropy alloys (HEAs) have drawn lots of attentions from researchers and industries because of their outstanding properties, such as high hardness, and good corrosion resistance. Among HEA systems, the refractory high entropy alloy is characterized by its high temperature strength and stable thermal properties.
    In this work, the VNbMoTaWAl and VNbMoTaWCrB, refractory HEA thin films were fabricated by a co-sputtering system. The CrB and Al content of VNbMoTaWAl and VNbMoTaWCrB were adjusted under difficult target power. The oxidizing test of VNbMoTaWAl and VNbMoTaWCrB were carried out in an air fumace in open air atmosphere. Beside the heating temperature was ranging from 300 to 800 oC and holding time 60 min.
    For the VNbMoTaWAl thin film with lower Al content has tie severe oxidation reaction, but the hardness of VNbMoTaWAl thin film with decreasing from 10.9 to 7.2 GPa.
    For the VNbMoTaWCrB thin film, it can be seen that the HEA films changed from BCC structure to amorphous phase, when the Cr and B concentration increased. The microstructure of HEA film changed from columnar to featureless with increasing Cr and B content. The HEAB3 film exhibited the maximum hardness of 14.4 GPa. We can conclude that very good oxidation resistance at 500 oC was obtained for hardness of each HEA coatings in this work.

    中文摘要 Abstract 誌謝 目錄 圖目錄 表目錄 第一章 緒論 1.1 研究背景 1.2 研究動機 第二章 文獻回顧 2.1高熵合金介紹 2.2高熵四大效應 2.2.1熱力學效應 2.2.2晶格畸變效應 2.2.3 遲滞擴散效應 2.2.4 雞尾酒效應 2.3高熵合金性能 2.3.1力學行為 2.3.2耐蝕性質 2.3.3高溫性能 2.4混合熱焓與價電子濃度對高熵相結構影響 2.5濺鍍 2.5.1濺鍍的原理 2.5.2薄膜成核成長 2.5.3製程偏壓對薄膜影響 2.6高熵合金薄膜 2.6.1擴散阻障層 2.6.2提升薄膜硬度 2.6.3抗高溫氧化塗層 第三章 實驗方法與步驟 3.1實驗流程與參數 3.1.1改變Al靶材功率鍍製高熵合金薄膜 3.1.2改變CrB2靶材功率鍍製高熵合金薄膜 3.2實驗方法與步驟 3.2.1試片製備 3.2.2實驗步驟 3.3製程儀器 3.3.1鍍膜設備 3.3.2高溫氧化設備 3.4分析儀器 3.4.1成分分析 3.4.2微結構分析 3.4.3晶體結構分析 3.4.4薄膜硬度分析 第四章 結果與討論 4.1改變Al靶材功率鍍製高熵合金薄膜 4.1.1成分分析 4.1.2微觀結構分析 4.1.2.1表面形貌分析 4.1.2.2橫截面形貌分析 4.1.3晶體結構分析 4.1.4薄膜硬度分析 4.2改變CrB2靶材功率鍍製高熵合金薄膜 4.2.1成分分析 4.2.2微觀結構分析 4.2.2.1表面形貌分析 4.2.2.2橫截面形貌分析 4.2.3晶體結構分析 4.2.3.1 XRD繞射分析 4.2.3.2 TEM分析 4.2.4薄膜硬度分析 第五章 結論 參考文獻 附錄A 含Al高熵合金之EDS成分分布 附錄B 含Cr、B高熵合金之EDS成分分布

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